Interference lithography

With light to individual structural geometry

© Fraunhofer IPT

Optical structure for laser interference lithography

In interference lithography, the beam of an argon laser is widened, divided and brought to interference by superposition. By positioning a photosensitive sample in this interference pattern, the pattern is stored as a linear structure in the polymer. The superposition angle of the two partial beams and the wavelength used determine the lattice constant of the structure. Multiple exposure after rotation of the sample allows cross- or hexagonal structures in addition to line gratings.

The Fraunhofer IPT uses a Spatial Light Modulator (SLM) to individualize the wave front of a partial beam and thus the structural geometry. The structures serve as masters for a galvanic impression in nickel, which is finally used as a tool in precision moulding.

The aim of the Fraunhofer IPT is to use SLM to create more individual structures and structures on curved surfaces in order to optimize the energy efficiency of the corresponding optical systems.

Our service

  • Feasibility studies for periodic structures, also on curved surfaces
  • Parameter tests to optimize individual structures
  • Impression of the structures in silicone or nickel

Applications and Projects

Optical Systems

Energy efficiency in optical systems, especially for lighting buildings or offices. Intelligent diffuser structures distribute light more efficiently, significantly reducing energy consumption.

Biologically functional structures

Micro- and nanostructures allow the differentiation of the body's own stem cells into certain body cells. This effect is a highly interesting field of research regarding to the production of personalized implants.

INTENSE

Intelligent lighting management for energy-efficient lighting through individual nanostructures. Using SLM-based interference lithography, the fabrication of nanostructures is made more flexible and possible for curved surfaces.